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专利名称：Positive photoresist composition发明人：Konoe Miura,Tameichi Ochiai,Yasuhiro
Kameyama
申请号：US07/0236申请日：19870309公开号：US04859563A公开日：190822
摘要：Disclosed herein is a positive photoresist composition containing (a) aphotosensitizer of 1,2-napthtoquinone diazides photosensitive-material comprising anester of 2,3,4,4'- tetrahydroxybenzophenone in which on the average, not less than twohydroxyl groups of 2,3,4,4'- tetrahydroxybenzophenone have been esterified by 1,2-naphthoquinonediazide-5-sulfonic acid and (b) a novolak resin obtained by condensing amixture of m-cresol, p-cresol and 2,5-xylenol with formaldehyde.
申请人：MITSUBISHI CHEMICAL INDUSTRIES LIMITED
代理机构：Oblon, Spivak, McClelland, Maier & Neustadt
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