专利内容由知识产权出版社提供
专利名称：Resist composition and process for
producing the same
发明人：Hanamoto, Yukio,Takagaki, Hiroshi,Ida,
Ayako
申请号：EP93107205.2申请日：19921228公开号：EP0558102A3公开日：19941102
摘要：This invention provides a process for producing a resist composition in which thecontent of relatively large undissolved particles is low just after production of thecomposition and the content of relatively large undissolved particles increases only to asmall extent even if the composition is stored for a long period of time. Thus, thisinvention provides a process for producing a resist composition which comprises filteringa mixture of an alkali-soluble resin, a radiation-sensitive compound and a solvent by theuse of a filter of which pore diameter is 0.1 µm or below and of which particle-removingperformance is 99% or above. Further, this invention provides also a resist compositioncomprising an alkali-soluble resin, a radiation-sensitive compound and an organic solventnot simultaneously having both an acetoxy group and an alkoxy group in its molecule,said composition containing undissolved particles having a particle diameter of 0.25 µm orabove in a number of 100 particles/ml or below, said undissolved particles beingconstituted of two particle groups one of which (the first group) has a particle diameterof 0.25-0.3 µm and the other of which (the second group) has a particle diameter largerthan 0.3 µm, and the content of said first particle group having a particle diameter of
0.25-0.3 µm being 50 particles/ml or below. According to the process of this invention, aresist composition excellent in storage stability, etc. can be obtained. By using said resistcomposition, the product yield in the production of integrated circuit can be improved.
申请人：SUMITOMO CHEMICAL COMPANY, LIMITED
地址：5-33, Kitahama 4-chome Chuo-ku Osaka JP
国籍：JP
代理机构：VOSSIUS & PARTNER
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